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开口隔离层上多晶硅薄膜制备
梁宗存; 柳锡运; 沈辉
2004-11-15
Source Publication第八届全国光伏会议暨中日光伏论坛 ; 第八届全国光伏会议暨中日光伏论坛
Source Publication第八届全国光伏会议暨中日光伏论坛 ; 第八届全国光伏会议暨中日光伏论坛
Conference Date2004-11-15
Conference Place深圳
Publication Place深圳
Funding Organization中国太阳能学会
Other Abstract在SSP 硅带衬底上制备开口SiO2 隔离层,在隔离层上沉积多晶硅薄膜籽晶层;然后以ZMR 将制备的多晶硅薄膜区融、进行再结晶,制备了SSP 隔离层上多晶硅薄膜,并制备了多晶硅薄膜电池。研究结果表明:ZMR 对籽晶层的区融、结晶效果比较理想,晶粒尺寸增大到厘米级长、毫米级宽;经过晶硅薄膜沉积后,开口隔离层的孔洞未完全被多晶硅薄膜层覆盖住;制备的电池的光特性参数Voc、Isc 、FF 都比较低,电池的最高转换效率为3.83﹪;指出了改进的工艺措施。
Keyword多晶硅薄膜电池 颗粒硅带 薄膜沉积
Language中文
Document Type会议论文
Identifierhttp://ir.giec.ac.cn/handle/344007/7900
Collection中国科学院广州能源研究所
Recommended Citation
GB/T 7714
梁宗存,柳锡运,沈辉. 开口隔离层上多晶硅薄膜制备[C]. 深圳,2004.
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